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Standard RTP,
Introduction

Heat source: Halogen tungsten lamp

Temperature control & Monitoring: thermocouple

Substrate size: Max 6 "wafer

Substrate temperature: Max 1,000℃

Rate of rise: ~ 30 ℃/ SEC

System control: PLC + touch (Manual L)

Optional:

Fully automatic numerical control

Data Recording (PLC + PC)



The Word Best Plasma
Contact: Mr. Yu, Mr. Tang
Tel:13612999216 13632910173
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